D. Deduytsche: search on Z-Library

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1

Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability

Dendooven, J., Deduytsche, D., Musschoot, J., Vanmeirhaeghe, R. L., Detavernier, C.

Journal:

Journal of The Electrochemical Society

Year:

2009

Language:

english

File:

PDF, 216 KB

english, 2009

2

Reactor concepts for atomic layer deposition on agitated particles: A review

Longrie, Delphine, Deduytsche, Davy, Detavernier, Christophe

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2014

Language:

english

File:

PDF, 2.25 MB

english, 2014

3

Crystallization and semiconductor-metal switching behavior of thin VO2 layers grown by atomic layer deposition

Rampelberg, Geert, Deduytsche, Davy, De Schutter, Bob, Premkumar, Peter Antony, Toeller, Michael, Schaekers, Marc, Martens, Koen, Radu, Iuliana, Detavernier, Christophe

Journal:

Thin Solid Films

Year:

2014

Language:

english

File:

PDF, 1.89 MB

english, 2014

4

Semiconductor-metal transition in thin VO[sub 2] films grown by ozone based atomic layer deposition

Rampelberg, Geert, Schaekers, Marc, Martens, Koen, Xie, Qi, Deduytsche, Davy, De Schutter, Bob, Blasco, Nicolas, Kittl, Jorge, Detavernier, Christophe

Journal:

Applied Physics Letters

Year:

2011

Language:

english

File:

PDF, 809 KB

english, 2011

5

Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma

Qi Xie, Jan Musschoot, Christophe Detavernier, Davy Deduytsche, Roland L Van Meirhaeghe, Sven Van den Berghe, Yu-Long Jiang, Guo-Ping Ru, Bing-Zong Li, Xin-Ping Qu

Journal:

Microelectronic Engineering

Year:

2008

Language:

english

File:

PDF, 1.18 MB

english, 2008

6

[ECS 214th ECS Meeting - Honolulu, HI (October 12 - October 17, 2008)] ECS Transactions - Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality

Detavernier, Christophe, Dendooven, Jolien, Deduytsche, Davy, Musschoot, Jan

Year:

2008

Language:

english

File:

PDF, 333 KB

english, 2008

7

A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

Delphine Longrie, Davy Deduytsche, Jo Haemers, Kris Driesen, Christophe Detavernier

Journal:

Surface and Coatings Technology

Year:

2012

Language:

english

File:

PDF, 1.28 MB

english, 2012

8

Atomic layer deposition of titanium nitride from TDMAT precursor

J. Musschoot, Q. Xie, D. Deduytsche, S. Van den Berghe, R.L. Van Meirhaeghe, C. Detavernier

Journal:

Microelectronic Engineering

Year:

2009

Language:

english

File:

PDF, 434 KB

english, 2009

9

[IEEE 2008 9th International Conference on Solid-State and Integrated-Circuit Technology (ICSICT) - Beijing, China (2008.10.20-2008.10.23)] 2008 9th International Conference on Solid-State and Integrated-Circuit Technology - Comparison of the Ru thin films grown on Si, TiN/Si and TaN/Si substrates by plasma enhanced atomic layer deposition

Xie, Qi, Musschoot, Jan, Detavernier, Christophe, Deduytsche, Davy, Van Meirhaeghe, Roland L., Jiang, Yu-Long, Ru, Guo-Ping, Li, Bing-Zong, Qu, Xin-Ping

Year:

2008

Language:

english

File:

PDF, 2.62 MB

english, 2008

10

Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots

Smeets, D., Demeulemeester, J., Deduytsche, D., Detavernier, C., Comrie, C. M., Theron, C. C., Lavoie, C., Vantomme, A.

Journal:

Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 562 KB

english, 2008

11

Germanium surface passivation and atomic layer deposition of high- k dielectrics—a tutorial review on Ge-based MOS capacitors

Xie, Qi, Deng, Shaoren, Schaekers, Marc, Lin, Dennis, Caymax, Matty, Delabie, Annelies, Qu, Xin-Ping, Jiang, Yu-Long, Deduytsche, Davy, Detavernier, Christophe

Journal:

Semiconductor Science and Technology

Year:

2012

Language:

english

File:

PDF, 2.15 MB

english, 2012

12

Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions

Roy, Amit K., Deduytsche, Davy, Detavernier, Christophe

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2013

Language:

english

File:

PDF, 1.36 MB

english, 2013

13

[ECS 210th ECS Meeting - Cancun, Mexico (October 29-November 3, 2006)] ECS Transactions - Influence of Alloying Elements on the Formation and Stability of NiSi

Detavernier, Christophe, Deduytsche, Davy, Jordan-Sweet, Jean, Cabral, Cyril, Lavoie, Christian

Year:

2006

Language:

english

File:

PDF, 3.55 MB

english, 2006

14

Defect Characterization of the Structure-Growth Zone-Model for Sputter Deposited Cu Films

De Baerdemaeker, Jérémie, Dauwe, Charles, Segers, Danny, Detavernier, C., Deduytsche, D., Egger, W., Sperr, Peter

Journal:

Materials Science Forum

Year:

2004

Language:

english

File:

PDF, 363 KB

english, 2004

15

TaN∕Ta as an Effective Diffusion Barrier for Direct Contact of Copper and NiSi

Jiang, Yu-Long, Xie, Qi, Qu, Xin-Ping, Zhang, David W, Deduytsche, Davy, Detavernier, Christophe

Journal:

Electrochemical and Solid-State Letters

Year:

2012

Language:

english

File:

PDF, 297 KB

english, 2012

16

Room temperature grain growth in sputtered Cu films

Deduytsche, D., Detavernier, C., Debaerdemaeker, J., Van Meirhaeghe, R.L., Dauwe, C., Kuan, T.S.

Journal:

MRS Proceedings

Year:

2002

Language:

english

File:

PDF, 1.97 MB

english, 2002

17

High-Performance Ge MOS Capacitors by $\hbox{O}_{2}$ Plasma Passivation and $\hbox{O}_{2}$ Ambient Annealing

Xie, Qi, Deng, Shaoren, Schaekers, Marc, Lin, Dennis, Caymax, Matty, Delabie, Annelies, Jiang, Yulong, Qu, Xinping, Deduytsche, Davy, Detavernier, Christophe

Journal:

IEEE Electron Device Letters

Year:

2011

Language:

english

File:

PDF, 281 KB

english, 2011

18

Aluminium atomic layer deposition applied to mesoporous zeolites for acid catalytic activity enhancement

Sree, Sreeprasanth Pulinthanathu, Dendooven, Jolien, Korányi, Tamás I., Vanbutsele, Gina, Houthoofd, Kristof, Deduytsche, Davy, Detavernier, Christophe, Martens, Johan A.

Journal:

Catalysis Science & Technology

Year:

2011

Language:

english

File:

PDF, 683 KB

english, 2011

19

Improved Thermal Stability and Electrical Performance by Using PEALD Ultrathin Al2O3 Film with Ta as Cu Diffusion Barrier on Low k Dielectrics

Ding, S.-F., Xie, Q., Chen, F., Lu, H.-S., Deng, S.-R., Deduytsche, D., Detavernier, C., Qu, X.-P.

Journal:

ECS Solid State Letters

Year:

2012

Language:

english

File:

PDF, 538 KB

english, 2012

20

Annealing induced hysteresis suppression for TiN/HfO 2 /GeON/p-Ge capacitor

Li, Quan-Li, Xie, Qi, Jiang, Yu-Long, Ru, Guo-Ping, Qu, Xin-Ping, Li, Bing-Zong, Zhang, David W, Deduytsche, Davy, Detavernier, Christophe

Journal:

Semiconductor Science and Technology

Year:

2011

Language:

english

File:

PDF, 874 KB

english, 2011

21

Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene

Roy, Amit K., Dendooven, Jolien, Deduytsche, Davy, Devloo-Casier, Kilian, Ragaert, Kim, Cardon, Ludwig, Detavernier, Christophe

Journal:

Chemical Communications

Year:

2015

Language:

english

File:

PDF, 2.23 MB

english, 2015

22

Plasma Enhanced Atomic Layer Deposition on Powders

Rampelberg, G., Longrie, D., Deduytsche, D., Detavernier, C.

Journal:

ECS Transactions

Year:

2014

Language:

english

File:

PDF, 3.55 MB

english, 2014

23

Formation and preferential orientation of Au-free Al/Ti-based ohmic contacts on different hexagonal nitride-based heterostructures

Geenen, F., Constant, A., Solano, E., Deduytsche, D., Mocuta, C., Coppens, P., Detavernier, C.

Journal:

Journal of Applied Physics

Year:

2020

File:

PDF, 5.39 MB

2020

24

Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

J. Musschoot, J. Dendooven, D. Deduytsche, J. Haemers, G. Buyle, C. Detavernier

Journal:

Surface and Coatings Technology

Year:

2012

Language:

english

File:

PDF, 1.12 MB

english, 2012

25

Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH 3 on Particles Agitated in a Rotary Reactor

Longrie, Delphine, Deduytsche, Davy, Haemers, Jo, Smet, Philippe F., Driesen, Kris, Detavernier, Christophe

Journal:

ACS Applied Materials & Interfaces

Year:

2014

Language:

english

File:

PDF, 3.99 MB

english, 2014

26

Mechanism of the Intermediary Phase Formation in Ti-20 wt. % Al Mixture during Pressureless Reactive Sintering

Školáková, Andrea, Salvetr, Pavel, Novák, Pavel, Leitner, Jindřich, Deduytsche, Davy

Journal:

Year:

2019

File:

PDF, 19.22 MB

2019

27

Growth Kinetics and Crystallization Behavior of TiO[sub 2] Films Prepared by Plasma Enhanced Atomic Layer Deposition

Xie, Qi, Musschoot, Jan, Deduytsche, Davy, Van Meirhaeghe, Roland L., Detavernier, Christophe, Van den Berghe, Sven, Jiang, Yu-Long, Ru, Guo-Ping, Li, Bing-Zong, Qu, Xin-Ping

Journal:

Journal of The Electrochemical Society

Year:

2008

Language:

english

File:

PDF, 819 KB

english, 2008

28

Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers

Rampelberg, Geert, Devloo-Casier, Kilian, Deduytsche, Davy, Schaekers, Marc, Blasco, Nicolas, Detavernier, Christophe

Journal:

Applied Physics Letters

Year:

2013

Language:

english

File:

PDF, 1.51 MB

english, 2013

29

Effective Schottky Barrier Height Modulation by an Ultrathin Passivation Layer of GeOxNy for Al∕n-Ge(100) Contact

Jiang, Yu-Long, Xie, Qi, Qu, Xin-Ping, Ru, Guo-Ping, Zhang, David W., Deduytsche, Davy, Detavernier, Christophe

Journal:

Electrochemical and Solid-State Letters

Year:

2011

Language:

english

File:

PDF, 166 KB

english, 2011

30

Sensing the framework state and guest molecules in MIL-53(Al) via the electron paramagnetic resonance spectrum of V IV dopant ions

Nevjestić, Irena, Depauw, Hannes, Gast, Peter, Tack, Pieter, Deduytsche, Davy, Leus, Karen, Van Landeghem, Melissa, Goovaerts, Etienne, Vincze, Laszlo, Detavernier, Christophe, Van Der Voort, Pascal,

Journal:

Physical Chemistry Chemical Physics

Year:

2017

Language:

english

File:

PDF, 6.25 MB

english, 2017

31

Implementing TiO[sub 2] as gate dielectric for Ge-channel complementary metal-oxide-semiconductor devices by using HfO[sub 2]/GeO[sub 2] interlayer

Xie, Qi, Deduytsche, Davy, Schaekers, Marc, Caymax, Matty, Delabie, Annelies, Qu, Xin-Ping, Detavernier, Christophe

Journal:

Applied Physics Letters

Year:

2010

Language:

english

File:

PDF, 558 KB

english, 2010

32

The effect of sputtered W-based carbide diffusion barriers on the thermal stability and void formation in copper thin films

Qi Xie, Yu-Long Jiang, Keon De Keyser, Christophe Detavernier, Davy Deduytsche, Guo-Ping Ru, Xin-Ping Qu, K.N. Tu

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 1.03 MB

english, 2010

33

In situ X-ray diffraction study of thin film Ir/Si solid state reactions

W. Knaepen, J. Demeulemeester, D. Deduytsche, J.L. Jordan-Sweet, A. Vantomme, R.L. Van Meirhaeghe, C. Detavernier, C. Lavoie

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 694 KB

english, 2010

34

TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition

Qi Xie, Davy Deduytsche, Jan Musschoot, Roland L. Van Meirhaeghe, Christophe Detavernier, Shao-Feng Ding, Xin-Ping Qu

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 1.20 MB

english, 2011

35

Study of Schottky barrier height modulation for NiSi/Si contact with an antimony interlayer

Guo, Xiao, Tang, Yang, Jiang, Yu-Long, Qu, Xin-Ping, Ru, Guo-Ping, Zhang, David Wei, Deduytsche, Davy, Detavernier, Christophe

Journal:

Microelectronic Engineering

Year:

2013

Language:

english

File:

PDF, 914 KB

english, 2013

36

Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing

Deng, Shaoren, Verbruggen, Sammy W., Lenaerts, Silvia, Martens, Johan A., Van den Berghe, Sven, Devloo-Casier, Kilian, Devulder, Wouter, Dendooven, Jolien, Deduytsche, Davy, Detavernier, Christophe

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2014

Language:

english

File:

PDF, 2.47 MB

english, 2014

37

Plasma-Enhanced ALD of Platinum with O2, N2 and NH3 Plasmas

Longrie, D., Devloo-Casier, K., Deduytsche, D., Van den Berghe, S., Driesen, K., Detavernier, C.

Journal:

ECS Journal of Solid State Science and Technology

Year:

2012

Language:

english

File:

PDF, 1.37 MB

english, 2012

38

Spacious and mechanically flexible mesoporous silica thin film composed of an open network of interlinked nanoslabs

Sree, Sreeprasanth Pulinthanathu, Dendooven, Jolien, Smeets, Dries, Deduytsche, Davy, Aerts, Alexander, Vanstreels, Kris, Baklanov, Mikhail R., Seo, Jin Won, Temst, Kristiaan, Vantomme, André, Detaver

Journal:

Journal of Materials Chemistry

Year:

2011

Language:

english

File:

PDF, 514 KB

english, 2011

39

Combinatorial Study of Ag–Te Thin Films and Their Application as Cation Supply Layer in CBRAM Cells

Devulder, Wouter, Opsomer, Karl, Meersschaut, Johan, Deduytsche, Davy, Jurczak, Malgorzata, Goux, Ludovic, Detavernier, Christophe

Journal:

ACS Combinatorial Science

Year:

2015

Language:

english

File:

PDF, 4.35 MB

english, 2015

40

Conformality of Al[sub 2]O[sub 3] and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition

Dendooven, J., Deduytsche, D., Musschoot, J., Vanmeirhaeghe, R. L., Detavernier, C.

Journal:

Journal of The Electrochemical Society

Year:

2010

Language:

english

File:

PDF, 342 KB

english, 2010

41

Room-temperature grain growth in sputter-deposited Cu films

Detavernier, C., Deduytsche, D., Van Meirhaeghe, R. L., De Baerdemaeker, J., Dauwe, C.

Journal:

Applied Physics Letters

Year:

2003

Language:

english

File:

PDF, 542 KB

english, 2003

42

High-temperature degradation of NiSi films: Agglomeration versus NiSi[sub 2] nucleation

Deduytsche, D., Detavernier, C., Van Meirhaeghe, R. L., Lavoie, C.

Journal:

Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 1.32 MB

english, 2005

43

Fermi Level Depinning Failure for Al/GeO2/Ge Contacts

Yu, H., Xie, Q., Jiang, Y.-L., Deduytsche, D., Detavernier, C.

Journal:

ECS Solid State Letters

Year:

2012

Language:

english

File:

PDF, 902 KB

english, 2012

44

Thickness Characterization Toolbox for Transparent Protective Coatings on Polymer Substrates

Van Zele, Matthias, Watté, Jonathan, Hasselmeyer, Jan, Rijckaert, Hannes, Vercammen, Yannick, Verstuyft, Steven, Deduytsche, Davy, Debecker, Damien, Poleunis, Claude, Van Driessche, Isabel, De Buysser

Journal:

Year:

2018

Language:

english

File:

PDF, 6.14 MB

english, 2018

45

Formation and stability of NiSi in the presence of Co and Fe alloying elements

D. Deduytsche, C. Detavernier, R. L. Van Meirhaeghe, J. L. Jordan-sweet, C. Lavoie

Year:

2008

Language:

english

File:

PDF, 1.25 MB

english, 2008

46

Ru thin film grown on TaN by plasma enhanced atomic layer deposition

Qi Xie, Yu-Long Jiang, Jan Musschoot, Davy Deduytsche, Christophe Detavernier, Roland L. Van Meirhaeghe, Sven Van den Berghe, Guo-Ping Ru, Bing-Zong Li, Xin-Ping Qu

Journal:

Thin Solid Films

Year:

2009

Language:

english

File:

PDF, 978 KB

english, 2009

47

Investigation of the Effect of Magnesium on the Microstructure and Mechanical Properties of NiTi Shape Memory Alloy Prepared by Self-Propagating High-Temperature Synthesis

Školáková, Andrea, Novák, Pavel, Salvetr, Pavel, Moravec, Hynek, Šefl, Václav, Deduytsche, Davy, Detavernier, Christophe

Journal:

Metallurgical and Materials Transactions A

Year:

2017

Language:

english

File:

PDF, 2.30 MB

english, 2017

48

Texture of atomic layer deposited ruthenium

J. Musschoot, Q. Xie, D. Deduytsche, K. De Keyser, D. Longrie, J. Haemers, S. Van den Berghe, R.L. Van Meirhaeghe, J. D’Haen, C. Detavernier

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 502 KB

english, 2010

49

Effective Electrical Passivation of Ge(100) for HfO2 Gate Dielectric Layers Using O2 Plasma

Xie, Qi, Deduytsche, Davy, Schaekers, Marc, Caymax, Matty, Delabie, Annelies, Qu, Xin-Ping, Detavernier, Christophe

Journal:

Electrochemical and Solid-State Letters

Year:

2011

Language:

english

File:

PDF, 628 KB

english, 2011

50

Mechanism of the Intermediary Phase Formation in Ti-20 wt. % Al Mixture during Pressureless Reactive Sintering

Školáková, Andrea, Salvetr, Pavel, Novák, Pavel, Leitner, Jindřich, Deduytsche, Davy

Journal:

Year:

2019

Language:

english

File:

PDF, 19.22 MB

english, 2019

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